PD300-G2
Technology: fsARC® (ARC evaporation)
Maximum plasma volume: Ø540*200 mm
Capacity of rotary tools: Ø10*130 mm – 175 pcs.
Up to 6 batches/day
Footprint [mm]: L3225 x W1800 x H2050
Global coating solutions
OCTOARC series
Cathodic ARC deposition is PVD process in which applying of a high current and low voltage on the surface of a target causes formation of cathodic spot with extremely high temperature (15 000°C) leading to vaporize material from a target. The arc has an extremely high power density resulting in a high level of ionization (30-100%), multiple charged ions, neutral particles, clusters and macro-particles (droplets). Surface of the coatings is less smooth (size and number of droplets can be decreased using filtered ARC cathode). Deposition rate is very high (several micrometers per hour)
Smooth and high performance coatings by fsARC cathode
- Resulting coatings are smoother and of a better quality as compared to typical arc coatings containing substantial amount of droplets
- Improved magnetic field configuration provides high utilization of target material
- Focusing effect of the magnetic field in the space between the target and the coated parts increased the plasma ionization level what leads to better quality of coatings
Cathode spot movement on the surface of a target controlled using modified acr evaporator
Coating prepare at the same deposition conditions using standard arc technology (left) and using the novel modified fsARC®c athode system (right)
Choose your solution
PD500-G2
Technology: fsARC® (ARC evaporation)
Maximum plasma volume: Ø540*380 mm
Capacity of rotary tools: Ø10*130 mm – 350 pcs.
Up to 5-6 batches/day
Footprint [mm]: L3500 x W1800 x H2250
PD700-G2
Technology: fsARC® (ARC evaporation)
Maximum plasma volume: Ø540*700 mm
Capacity of rotary tools: Ø10*130 mm – 525 pcs.
Up to 4-5 batches/day
Footprint [mm]: L3500 x W1800 x H2250
